Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11762293 | Fabricating method of reducing photoresist footing | Hao-Hsuan Chang, Da-Jun Lin, Yao-Hsien Chung, Ting-An Chien, Bin-Siang Tsai +3 more | 2023-09-19 |
| 11648749 | Rigid board plastic flooring and its production method | — | 2023-05-16 |
| 10559655 | Semiconductor device and method for manufacturing the same | Chia-Ming Kuo, Fu-Jung Chuang, Chun-Wei Yu, Po-Jen Chuang, Yu-Ren Wang | 2020-02-11 |
| 10505041 | Semiconductor device having epitaxial layer with planar surface and protrusions | Chun-Wei Yu, Chueh-Yang Liu, Yu-Ren Wang, Kuang-Hsiu Chen | 2019-12-10 |
| 10460925 | Method for processing semiconductor device | Kuang-Hsiu Chen, Chun-Wei Yu, Keng-Jen Lin, Yu-Ren Wang | 2019-10-29 |
| 10366991 | Semiconductor device and manufacturing method thereof | Yu-Ying Lin, Yen-Hsing Chen, Chun-Jen Chen, Chun-Wei Yu, Keng-Jen Lin +1 more | 2019-07-30 |
| 10332750 | Method for fabricating semiconductor device with strained silicon structure | Kuang-Hsiu Chen, Chung-Fu Chang, Shi-You Liu, Chun-Wei Yu, Yu-Ren Wang | 2019-06-25 |
| 10079143 | Method of forming semiconductor device having wick structure | Chun-Wei Yu, Chueh-Yang Liu, Yu-Ren Wang | 2018-09-18 |
| 9966266 | Apparatus for semiconductor wafer treatment and semiconductor wafer treatment | Yu-Ying Lin, Chueh-Yang Liu, Yu-Ren Wang, Chun-Wei Yu, Kuang-Hsiu Chen +2 more | 2018-05-08 |
| 9793105 | Fabricating method of fin field effect transistor (FinFET) | Chun-Wei Yu, Chueh-Yang Liu, Yu-Ren Wang, Kuang-Hsiu Chen, Yi-Liang Ye | 2017-10-17 |
| 9728397 | Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure | Chun-Wei Yu, Chueh-Yang Liu, Yu-Ren Wang | 2017-08-08 |
| 9646889 | Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate | Chun-Wei Yu, Chueh-Yang Liu, Yu-Ren Wang, Kuang-Hsiu Chen | 2017-05-09 |
| 9514993 | Method for manufacturing semiconductor devices comprising epitaxial layers | Chun-Wei Yu, Ted Ming-Lang Guo, Yu-Ren Wang | 2016-12-06 |