NF

Nicholas Fichtenbaum

TR Transphorm: 14 patents #9 of 34Top 30%
University of California: 1 patents #8,022 of 18,278Top 45%
Overall (All Time): #320,826 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9865719 Carbon doping semiconductor devices Stacia Keller, Brian L. Swenson 2018-01-09
9685323 Buffer layer structures suited for III-nitride devices with foreign substrates Stacia Keller, Brian L. Swenson 2017-06-20
9293561 High voltage III-nitride semiconductor devices Umesh Mishra, Lee McCarthy 2016-03-22
9257547 III-N device structures having a non-insulating substrate Lee McCarthy, Yifeng Wu 2016-02-09
9245993 Carbon doping semiconductor devices Stacia Keller, Brian L. Swenson 2016-01-26
9245992 Carbon doping semiconductor devices Stacia Keller, Brian L. Swenson 2016-01-26
9224671 III-N device structures and methods Primit Parikh, Yuvaraj Dora, Yifeng Wu, Umesh Mishra, Rakesh K. Lal 2015-12-29
9171836 Method of forming electronic components with increased reliability Rakesh K. Lal, Robert Coffie, Yifeng Wu, Primit Parikh, Yuvaraj Dora +2 more 2015-10-27
9165766 Buffer layer structures suited for III-nitride devices with foreign substrates Stacia Keller, Brian L. Swenson 2015-10-20
8895421 III-N device structures and methods Primit Parikh, Yuvaraj Dora, Yifeng Wu, Umesh Mishra, Rakesh K. Lal 2014-11-25
8860495 Method of forming electronic components with increased reliability Rakesh K. Lal, Robert Coffie, Yifeng Wu, Primit Parikh, Yuvaraj Dora +2 more 2014-10-14
8742459 High voltage III-nitride semiconductor devices Umesh Mishra, Lee McCarthy 2014-06-03
8643062 III-N device structures and methods Primit Parikh, Yuvaraj Dora, Yifeng Wu, Umesh Mishra, Rakesh K. Lal 2014-02-04
8598937 High power semiconductor electronic components with increased reliability Rakesh K. Lal, Robert Coffie, Yifeng Wu, Primit Parikh, Yuvaraj Dora +2 more 2013-12-03
8193020 Method for heteroepitaxial growth of high-quality N-face GaN, InN, and AlN and their alloys by metal organic chemical vapor deposition Stacia Keller, Umesh Mishra 2012-06-05