| 7183602 |
Ferroelectric capacitor hydrogen barriers and methods for fabricating the same |
Theodore S. Moise, Scott R. Summerfelt |
2007-02-27 |
| 7019352 |
Low silicon-hydrogen sin layer to inhibit hydrogen related degradation in semiconductor devices having ferroelectric components |
Martin G. Albrecht, Theodore S. Moise, Scott R. Summerfelt, Sarah Hartwig |
2006-03-28 |
| 6984857 |
Hydrogen barrier for protecting ferroelectric capacitors in a semiconductor device and methods for fabricating the same |
Martin G. Albrecht, Theodore S. Moise, Scott R. Summerfelt, Sanjeev Aggarwal, Jeff L. Large |
2006-01-10 |
| 6982448 |
Ferroelectric capacitor hydrogen barriers and methods for fabricating the same |
Theodore S. Moise, Scott R. Summerfelt |
2006-01-03 |
| 6876021 |
Use of amorphous aluminum oxide on a capacitor sidewall for use as a hydrogen barrier |
J. Scott Martin, Scott R. Summerfelt, Theodore S. Moise, Kelly Taylor, Luigi Colombo +3 more |
2005-04-05 |
| 6856534 |
Ferroelectric memory with wide operating voltage and multi-bit storage per cell |
John Anthony Rodriguez |
2005-02-15 |
| 6841396 |
VIA0 etch process for FRAM integration |
Francis G. Celii, Scott R. Summerfelt, Theodore S. Moise |
2005-01-11 |