DV

Douglas P. Verret

TI Texas Instruments: 16 patents #831 of 12,488Top 7%
Overall (All Time): #298,305 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9379176 Well resistors and polysilicon resistors Stephen Keith Heinrich-Barna, Alwin Tsao 2016-06-28
9202859 Well resistors and polysilicon resistors Stephen Keith Heinrich-Barna, Alwin Tsao 2015-12-01
6130144 Method for making very shallow junctions in silicon devices — 2000-10-10
5298450 Process for simultaneously fabricating isolation structures for bipolar and CMOS circuits — 1994-03-29
5212352 Self-aligned tungsten-filled via Jeffrey E. Brighton 1993-05-18
5198372 Method for making a shallow junction bipolar transistor and transistor formed thereby — 1993-03-30
5104816 Polysilicon self-aligned bipolar device including trench isolation and process of manufacturing same Jeffrey E. Brighton, Deems R. Hollingsworth, Manuel L. Torreno, Jr. 1992-04-14
5089428 Method for forming a germanium layer and a heterojunction bipolar transistor Kenneth E. Bean 1992-02-18
5065217 Process for simultaneously fabricating isolation structures for bipolar and CMOS circuits — 1991-11-12
5023690 Merged bipolar and complementary metal oxide semiconductor transistor device Michael C. Smayling, Abnash C. Sachdeva, Stephen A. Keller 1991-06-11
4996133 Self-aligned tungsten-filled via process and via formed thereby Jeffrey E. Brighton 1991-02-26
4843453 Metal contacts and interconnections for VLSI devices Robert C. Hooper, Bobby A. Roane 1989-06-27
4799099 Bipolar transistor in isolation well with angled corners Jeffrey E. Brighton, Deems R. Hollingsworth, Manuel L. Torreno, Jr. 1989-01-17
4797372 Method of making a merge bipolar and complementary metal oxide semiconductor transistor device Michael C. Smayling, Abnash C. Sachdeva, Stephen A. Keller 1989-01-10
4742014 Method of making metal contacts and interconnections for VLSI devices with copper as a primary conductor Robert C. Hooper, Bobby A. Roane 1988-05-03
4619887 Method of plating an interconnect metal onto a metal in VLSI devices Robert C. Hooper, Bobby A. Roane 1986-10-28