AP

Ashesh Parikh

TI Texas Instruments: 14 patents #973 of 12,488Top 8%
AL Accenture Global Solutions Limited: 2 patents #655 of 3,138Top 25%
Overall (All Time): #289,217 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12020124 Selecting optimum primary and secondary parameters to calibrate and generate an unbiased forecasting model Afzal Husain, Suresh Aswathnarayana, Paolo Astro, Mercedes Monroy 2024-06-25
11775852 Network optimization Afzal Husain, Alon Arad, Suresh Aswathnarayana, Ragnar-Miguel Myhrer, Tejas Rao +3 more 2023-10-03
10339251 Method to improve transistor matching Chi-Chien Ho, Thomas John Smelko, Rajni J. Aggarwal 2019-07-02
9853086 CMOS-based thermopile with reduced thermal conductance Henry Litzmann Edwards, Toan Tran, Jeffrey R. Debord, Bradley David Sucher 2017-12-26
9665675 Method to improve transistor matching Chi-Chien Ho, Thomas John Smelko, Rajni J. Aggarwal 2017-05-30
9496313 CMOS-based thermopile with reduced thermal conductance Henry Litzmann Edwards, Toan Tran, Jeffrey R. Debord, Bradley David Sucher 2016-11-15
8806388 Extraction of imaging parameters for computational lithography using a data weighting algorithm 2014-08-12
8793626 Computational lithography with feature upsizing Chi-Chien Ho, Thomas John Smelko 2014-07-29
8394681 Transistor layout for manufacturing process control Anand Seshadri 2013-03-12
8015513 OPC models generated from 2D high frequency test patterns Willie J. Yarbrough 2011-09-06
7985990 Transistor layout for manufacturing process control Anand Seshadri 2011-07-26
7842955 Carbon nanotube transistors on a silicon or SOI substrate Andrew Marshall 2010-11-30
7772059 Method for fabricating graphene transistors on a silicon or SOI substrate Andrew Marshall 2010-08-10
7687308 Method for fabricating carbon nanotube transistors on a silicon or SOI substrate Andrew Marshall 2010-03-30
7562333 Method and process for generating an optical proximity correction model based on layout density Jarvis Benjamin Jacobs 2009-07-14
7458058 Verifying a process margin of a mask pattern using intermediate stage models William R. McKee, Thomas J. Aton 2008-11-25