Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406877 | Homogeneous source/drain contact structure | Chang-Wen Chen, Po-Hsiang Huang | 2025-09-02 |
| 12387977 | Self-aligned scheme for semiconductor device and method of forming the same | Hsiu-Wen Hsueh, Cai-Ling Wu, Chii-Ping Chen, Neng-Jye Yang | 2025-08-12 |
| 12368103 | Diffusion barrier layer for conductive via to decrease contact resistance | Hsiu-Wen Hsueh, Chii-Ping Chen, Neng-Jye Yang, Ya-Lien Lee, An-Jiao Fu | 2025-07-22 |
| 12362235 | Barrier free interface between BEOL interconnects | Hsiu-Wen Hsueh, Chii-Ping Chen, Po-Hsiang Huang | 2025-07-15 |
| 11830770 | Self-aligned scheme for semiconductor device and method of forming the same | Hsiu-Wen Hsueh, Cai-Ling Wu, Chii-Ping Chen, Neng-Jye Yang | 2023-11-28 |
| 11742291 | Diffusion barrier layer for conductive via to decrease contact resistance | Hsiu-Wen Hsueh, Chii-Ping Chen, Neng-Jye Yang, Ya-Lien Lee, An-Jiao Fu | 2023-08-29 |
| 11694926 | Barrier free interface between beol interconnects | Hsiu-Wen Hsueh, Chii-Ping Chen, Po-Hsiang Huang | 2023-07-04 |
| 11362035 | Diffusion barrier layer for conductive via to decrease contact resistance | Hsiu-Wen Hsueh, Chii-Ping Chen, Neng-Jye Yang, Ya-Lien Lee, An-Jiao Fu | 2022-06-14 |
| 11342222 | Self-aligned scheme for semiconductor device and method of forming the same | Hsiu-Wen Hsueh, Cai-Ling Wu, Chii-Ping Chen, Neng-Jye Yang | 2022-05-24 |