Issued Patents All Time
Showing 26–50 of 193 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272729 | Asymmetric source/drain for backside source contact | Feng-Ching Chu, Chia-Pin Lin | 2025-04-08 |
| 12266576 | Semiconductor device and methods of manufacture | Yen-Ting Chen, Feng-Cheng Yang, Yen-Ming Chen | 2025-04-01 |
| 12266655 | Transistors with recessed silicon cap and method forming same | Yen-Ting Chen, Bo-Yu Lai, Chien-Wei Lee, Hsueh-Chang Sung, Feng-Cheng Yang +1 more | 2025-04-01 |
| 12268023 | Devices with improved operational current and reduced leakage current | Po-Yu Lin, Tzu-Hua Chiu, Chia-Pin Lin, Yuan-Ching Peng | 2025-04-01 |
| 12255112 | Test key and semiconductor die including the same | Tse-Pan Yang, Kuo-Pei Lu, Jen-Yuan Chang | 2025-03-18 |
| 12237390 | Low resistance contact feature | Szu-Wei Tseng, Wei-Yuan Lu, Chia-Pin Lin, Tzu-Wei Kao | 2025-02-25 |
| 12237399 | Nano-FET transistor with alternating nanostructures and method of forming thereof | Te-En Cheng, Yung-Cheng Lu, Chi On Chui | 2025-02-25 |
| 12237403 | Structure of a fin field effect transistor (FinFET) comprising epitaxial structures | Chih-Shan Chen | 2025-02-25 |
| 12237230 | Semiconductor device with leakage current suppression and method for forming the same | Bo-Yu Lai, Jyun-Chih Lin, Yen-Ting Chen, Chia-Pin Lin, Wei Hao Lu +1 more | 2025-02-25 |
| 12237232 | Methods for forming source/drain features | I-Hsieh Wong, Chia-Pin Lin, Yuan-Ching Peng | 2025-02-25 |
| 12218138 | Air gap formation between gate spacer and epitaxy structure | Bo-Yu Lai, Kai-Hsuan Lee, Feng-Cheng Yang, Yen-Ming Chen | 2025-02-04 |
| 12211749 | Cut EPI process and structures | Feng-Ching Chu, Chia-Pin Lin | 2025-01-28 |
| 12191370 | Semiconductor device with tunable channel layer usage and methods of fabrication thereof | Bo-Yu Lai, Ming-Lung Cheng, Chia-Pin Lin, Yuan-Ching Peng | 2025-01-07 |
| 12191369 | Source and drain engineering process for multigate devices | Po-Yu Lin, Chia-Pin Lin, Tzu-Hua Chiu, Kuan-Hao Cheng, Wei-Han Fan +2 more | 2025-01-07 |
| 12176400 | Backside contact with air spacer | Chen-Ming Lee | 2024-12-24 |
| 12154947 | Methods of forming epitaxial source/drain features in semiconductor devices | Tzu-Hsiang Hsu, Ting-Yeh Chen, Feng-Cheng Yang, Yen-Ming Chen | 2024-11-26 |
| 12142647 | Self-aligning backside contact process and devices thereof | Wei-Han Fan, Tzu-Hua Chiu, Chia-Pin Lin | 2024-11-12 |
| 12136658 | Integrated circuit with doped low-k sidewall spacers for gate stacks | Yen-Ting Chen, Feng-Cheng Yang, Yen-Ming Chen | 2024-11-05 |
| 12125889 | Source/drain contact with low-k contact etch stop layer and method of fabricating thereof | Ting-Yeh Chen, Chia-Pin Lin, Da-Wen Lin | 2024-10-22 |
| 12107165 | Semiconductor device structure with cap layer | Feng-Ching Chu, Feng-Cheng Yang, Yen-Ming Chen | 2024-10-01 |
| 12087837 | Semiconductor device with backside contact and methods of forming such | Ting-Yeh Chen, Yen-Ting Chen, Chia-Pin Lin | 2024-09-10 |
| 12080800 | Semiconductor devices with modified source/drain feature and methods thereof | Wei-Jen Lai, De-Fang Chen, Ting-Wen Shih | 2024-09-03 |
| 12080775 | Semiconductor device and forming method thereof | Wen-Kai Lin, Shih-Chiang Chen, Po-Shao Lin, Chia-Pin Lin, Yuan-Ching Peng | 2024-09-03 |
| 12068389 | Semiconductor device including gas spacers and method of manufacture | Yen-Ting Chen, Feng-Cheng Yang, Yen-Ming Chen | 2024-08-20 |
| 12068371 | Method for FinFET LDD doping | Chun Hsiung Tsai, Ya-Yun Cheng, Shahaji B. More, Cheng-Yi Peng, Kuo-Feng Yu +2 more | 2024-08-20 |