TT

Teng-Chun Tsai

TSMC: 139 patents #142 of 12,232Top 2%
UM United Microelectronics: 69 patents #33 of 4,560Top 1%
UC Uwiz Technology Co.: 3 patents #7 of 20Top 35%
NC National Science Council: 1 patents #238 of 867Top 30%
Overall (All Time): #3,045 of 4,157,543Top 1%
209
Patents All Time

Issued Patents All Time

Showing 176–200 of 209 patents

Patent #TitleCo-InventorsDate
7651960 Chemical vapor deposition method preventing particles forming in chamber Neng-Kuo Chen, Hsiu-Lien Liao 2010-01-26
7645712 Method of forming contact Neng-Kuo Chen, Chien-Chung Huang 2010-01-12
7642166 Method of forming metal-oxide-semiconductor transistors Kun-Hsien Lee, Cheng-Tung Huang, Wen-Han Hung, Shyh-Fann Ting, Li-Shian Jeng +4 more 2010-01-05
7588883 Method for forming a gate and etching a conductive layer Neng-Kuo Chen, Hsiu-Lien Liao 2009-09-15
7566668 Method of forming contact Neng-Kuo Chen, Chien-Chung Huang 2009-07-28
7544603 Method of fabricating silicon nitride layer and method of fabricating semiconductor device Neng-Kuo Chen, Hsiu-Lien Liao 2009-06-09
7544305 Chemical mechanical polishing process for forming shallow trench isolation structure Chia-Jung Hsu, Art Yu, Hsiao-Ling Lu 2009-06-09
7541298 STI of a semiconductor device and fabrication method thereof Shao-Ta Hsu, Neng-Kuo Chen 2009-06-02
7494878 Metal-oxide-semiconductor transistor and method of forming the same Kun-Hsien Lee, Cheng-Tung Huang, Wen-Han Hung, Shyh-Fann Ting, Li-Shian Jeng +4 more 2009-02-24
7485515 Method of manufacturing metal oxide semiconductor Neng-Kuo Chen, Chien-Chung Huang 2009-02-03
7332447 Method of forming a contact Neng-Kuo Chen, Chien-Chung Huang 2008-02-19
7294572 Method of forming contact Chao-Lon Yang, Neng-Kuo Chen, Chien-Chung Huang, Shao-Ta Hsu 2007-11-13
7294575 Chemical mechanical polishing process for forming shallow trench isolation structure Chia-Rung Hsu, Art Yu, Hsiao-Ling Lu 2007-11-13
7238586 Seamless trench fill method utilizing sub-atmospheric pressure chemical vapor deposition technique Shao-Ta Hsu, Neng-Kuo Chen 2007-07-03
7232752 Method of removing contaminants from a silicon wafer after chemical-mechanical polishing operation Shao-Chung Hu, Chia-Lin Hsu, Yung-Tsung Wei 2007-06-19
7172970 Polish method for semiconductor device planarization Zong-Huei Lin, Art Yu, Chia-Rung Hsu 2007-02-06
7025661 Chemical mechanical polishing process Chia-Lin Hsu 2006-04-11
6989337 Silicon oxide gap-filling process Hsiu-Chuan Chu, Chih-An Huang, Neng-Kuo Chen 2006-01-24
6913978 Method for forming shallow trench isolation structure Neng-Kuo Chen, Hsiu-Chuan Chu, Chih-An Huang, Hsiao-Ling Lu 2005-07-05
6831013 Method of forming a dual damascene via by using a metal hard mask layer Chia-Lin Hsu 2004-12-14
6706140 Control system for in-situ feeding back a polish profile Chia-Lin Hsu, Shao-Chung Hu 2004-03-16
6696361 Post-CMP removal of surface contaminants from silicon wafer Shao-Chung Hu, Chia-Lin Hsu, Yung-Tsung Wei 2004-02-24
6638830 Method for fabricating a high-density capacitor Chia-Lin Hsu, Yi-Fang Cheng 2003-10-28
6616510 Chemical mechanical polishing method for copper Chia-Lin Hsu, Yung-Tsung Wei, Ming-Sheng Yang 2003-09-09
6593185 Method of forming embedded capacitor structure applied to logic integrated circuit Chia-Lin Hsu, Yi-Fang Cheng, Yi-Hsiung Lin 2003-07-15