Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11430892 | Inner spacers for gate-all-around transistors | Kuo-Cheng Chiang, Zhi-Chang Lin, Shih-Cheng Chen, Chih-Hao Wang, Lo-Heng Chang +1 more | 2022-08-30 |
| 11430891 | Gate all around structure with additional silicon layer and method for forming the same | Chen-Han Wang, Chun-Hsiung Lin, Chih-Hao Wang | 2022-08-30 |
| 11348836 | Semiconductor structure with nanostructure and method for manufacturing the same | Chun-Hsiung Lin, Chih-Hao Wang, Chih-Chao Chou | 2022-05-31 |
| 11335776 | Hybrid channel semiconductor device and method | Pei-Yu Wang | 2022-05-17 |
| 11322409 | Multi-gate devices and method of fabricating the same | Lo-Heng Chang, Chih-Hao Wang, Kuo-Cheng Chiang, Jung-Hung Chang | 2022-05-03 |
| 11302796 | Method of forming self-aligned source/drain metal contacts | Kuo-Cheng Chiang, Chih-Hao Wang | 2022-04-12 |
| 11251090 | Dual channel gate all around transistor device and fabrication methods thereof | Chih-Hao Wang, Jui-Chien Huang, Chun-Hsiung Lin, Kuo-Cheng Chiang, Chih-Chao Chou | 2022-02-15 |
| 11211472 | Semiconductor device and method of forming the same | Shih-Cheng Chen, Kuo-Cheng Chiang, Chih-Hao Wang | 2021-12-28 |
| 11205711 | Selective inner spacer implementations | Kuo-Cheng Chiang, Lo-Heng Chang, Jung-Hung Chang, Chih-Hao Wang | 2021-12-21 |
| 11158727 | Structure and method for gate-all-around device with extended channel | Chih-Chao Chou, Chun-Hsiung Lin, Ching-Wei Tsai, Chih-Hao Wang | 2021-10-26 |
| 11139379 | Semiconductor structure and method for forming the same | Zhi-Chang Lin, Shih-Cheng Chen, Kuo-Cheng Chiang, Chih-Hao Wang | 2021-10-05 |
| 11121037 | Semiconductor device structure and method for forming the same | Ching-Wei Tsai, Yu-Xuan Huang, Kuan-Lun Cheng, Chih-Hao Wang, Min Cao +3 more | 2021-09-14 |
| 11049774 | Hybrid source drain regions formed based on same Fin and methods forming same | Shih-Cheng Chen, Chun-Hsiung Lin, Chih-Hao Wang | 2021-06-29 |
| 10944009 | Methods of fabricating a FinFET device with wrap-around silicide source/drain structure | Chih-Chao Chou, Shih-Cheng Chen, Jung-Hung Chang, Jui-Chien Huang, Chun-Hsiung Lin +1 more | 2021-03-09 |
| 10923598 | Gate-all-around structure and methods of forming the same | Chun-Hsiung Lin, Chih-Hao Wang | 2021-02-16 |
| 10847426 | FinFET devices and methods of forming the same | Chih-Hao Wang, Jui-Chien Huang, Kuo-Cheng Ching, Chun-Hsiung Lin | 2020-11-24 |
| 10825919 | Methods of fabricating semiconductor devices having gate-all-around structure with inner spacer last process | Chun-Hsiung Lin, Chih-Hao Wang, Kuo-Cheng Ching, Jui-Chien Huang | 2020-11-03 |
| 10811515 | Methods of fabricating semiconductor devices having air-gap spacers | Chun-Hsiung Lin, Chih-Chao Chou, Chia-Hao Chang, Chih-Hao Wang | 2020-10-20 |
| 10804162 | Dual channel gate all around transistor device and fabrication methods thereof | Chih-Hao Wang, Jui-Chien Huang, Chun-Hsiung Lin, Kuo-Cheng Chiang, Chih-Chao Chou | 2020-10-13 |
| 10727134 | Methods of fabricating semiconductor devices with gate-all-around structure | Chun-Hsiung Lin, Chih-Hao Wang, Chih-Chao Chou | 2020-07-28 |