Issued Patents All Time
Showing 126–150 of 342 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10714394 | Fin isolation structures of semiconductor devices | Chih-Hao Wang, Kuan-Lun Cheng, Yen-Ming Chen | 2020-07-14 |
| 10700183 | Fin field effect transistor (FinFET) device structure and method for forming the same | Kuan-Ting Pan, Shi Ning Ju, Chih-Hao Wang | 2020-06-30 |
| 10700075 | Structure and method for SRAM FinFET device having an oxide feature | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2020-06-30 |
| 10699964 | Silicon and silicon germanium nanowire formation | Carlos H. Diaz, Jean-Pierre Colinge | 2020-06-30 |
| 10692867 | Method and structure for FinFET device | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2020-06-23 |
| 10692865 | Semiconductor device and fabricating the same | Ting-Hung Hsu | 2020-06-23 |
| 10680109 | CMOS semiconductor device having fins and method of fabricating the same | Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Li-Te Lin | 2020-06-09 |
| 10672892 | Self-aligned epitaxy layer | Chih-Hao Wang, Kuan-Lun Cheng | 2020-06-02 |
| 10665691 | Semiconductor structure | Shi Ning Ju, Chih-Hao Wang, Ying-Keung Leung | 2020-05-26 |
| 10658490 | Structure and formation method of isolation feature of semiconductor device structure | Shi Ning Ju, Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2020-05-19 |
| 10658362 | Semiconductor component and fabricating method thereof | Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2020-05-19 |
| 10658245 | Etch profile control of polysilicon structures of semiconductor devices | Chih-Hao Wang, Kuan-Ting Pan | 2020-05-19 |
| 10651171 | Integrated circuit with a gate structure and method making the same | Ying-Keung Leung, Chi On Chui | 2020-05-12 |
| 10644154 | Semiconductor device and manufacturing method thereof | Ching-Wei Tsai, Chih-Hao Wang, Wai-Yi Lien | 2020-05-05 |
| 10636910 | Semiconductor device structure and method of forming the same | Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2020-04-28 |
| 10629737 | Method for fabricating FinFET including forming an oxide layer | Chih-Hao Wang, Gwan Sin Chang, Zhiqiang Wu | 2020-04-21 |
| 10622464 | Integrated circuit structure with substrate isolation and un-doped channel | Guan-Lin Chen | 2020-04-14 |
| 10553699 | Gate structure of a semiconductor device | Ming Zhu, Hui-Wen Lin, Harry-Hak-Lay Chuang, Bao-Ru Young, Yuan-Sheng Huang +4 more | 2020-02-04 |
| 10541319 | Fin structures having varied fin heights for semiconductor device | Chih-Hao Wang, Shi Ning Ju | 2020-01-21 |
| 10529833 | Integrated circuit with a fin and gate structure and method making the same | Teng-Chun Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2020-01-07 |
| 10522407 | FinFET channel on oxide structures and related methods | Ching-Wei Tsai, Ying-Keung Leung | 2019-12-31 |
| 10522416 | FinFET device having oxide region between vertical fin structures | Ying-Keung Leung | 2019-12-31 |
| 10516051 | FinFET and method of fabrication thereof | Kuan-Ting Pan, Ching-Wei Tsai, Ying-Keung Leung, Chih-Hao Wang, Carlos H. Diaz | 2019-12-24 |
| 10516049 | Multi-gate device and method of fabrication thereof | Ching-Wei Tsai, Carlos H. Diaz, Chih-Hao Wang, Wai-Yi Lien, Ying-Keung Leung | 2019-12-24 |
| 10510873 | Semiconductor device and manufacturing method thereof | Shi Ning Ju, Kuan-Ting Pan, Kuan-Lun Cheng, Chih-Hao Wang | 2019-12-17 |