Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10686075 | Self-aligned gate hard mask and method forming same | Bo-Yu Lai, Sheng-Chen Wang, Sai-Hooi Yeong, Yen-Ming Chen, Chi On Chui | 2020-06-16 |
| 10535569 | Forming transistor by selectively growing gate spacer | Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Bo-Yu Lai, Bo-Cyuan Lu +4 more | 2020-01-14 |
| 10535525 | Method for forming semiconductor device structure | Chun-An Lin, Chun-Hsiung Lin, Sai-Hooi Yeong, Cheng-Yu Yang, Yen-Ting Chen | 2020-01-14 |
| 10529725 | Flexible merge scheme for source/drain epitaxy regions | Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Sai-Hooi Yeong, Feng-Cheng Yang +1 more | 2020-01-07 |
| 10515896 | Interconnect structure for semiconductor device and methods of fabrication thereof | Chia-Ta Yu, Yen-Ming Chen, Chi On Chui, Sai-Hooi Yeong | 2019-12-24 |
| 10490650 | Low-k gate spacer and methods for forming the same | Wen-Kai Lin, Bo-Yu Lai, Li Chun Te, Sai-Hooi Yeong, Tien-I Bao +1 more | 2019-11-26 |
| 10483266 | Flexible merge scheme for source/drain epitaxy regions | Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Sai-Hooi Yeong, Feng-Cheng Yang +1 more | 2019-11-19 |
| 10283624 | Semiconductor structure and method for forming the same | Bo-Yu Lai, Chi On Chui, Cheng-Yu Yang, Yen-Ting Chen, Sai-Hooi Yeong +2 more | 2019-05-07 |
| 10163728 | Semiconductor device having a stacked fin structure and manufacturing method thereof | Sheng-Chen Wang, Sai-Hooi Yeong, Chia-Ta Yu | 2018-12-25 |
| 10141231 | FinFET device with wrapped-around epitaxial structure and manufacturing method thereof | Cheng-Yu Yang, Chia-Ta Yu, Sai-Hooi Yeong, Feng-Cheng Yang | 2018-11-27 |
| 10103146 | FinFET device with epitaxial structures that wrap around the fins and the method of fabricating the same | Chia-Ta Yu, Sheng-Chen Wang, Cheng-Yu Yang, Sai-Hooi Yeong, Feng-Cheng Yang +1 more | 2018-10-16 |
| 10062784 | Self-aligned gate hard mask and method forming same | Bo-Yu Lai, Sheng-Chen Wang, Sai-Hooi Yeong, Yen-Ming Chen, Chi On Chui | 2018-08-28 |
| 10037923 | Forming transistor by selectively growing gate spacer | Chia-Ta Yu, Cheng-Yu Yang, Sheng-Chen Wang, Bo-Yu Lai, Bo-Cyuan Lu +4 more | 2018-07-31 |
| 9997631 | Methods for reducing contact resistance in semiconductors manufacturing process | Cheng-Yu Yang, Sheng-Chen Wang, Sai-Hooi Yeong, Yi-Fang Pai, Yen-Ming Chen | 2018-06-12 |
| 9865595 | FinFET device with epitaxial structures that wrap around the fins and the method of fabricating the same | Chia-Ta Yu, Sheng-Chen Wang, Cheng-Yu Yang, Sai-Hooi Yeong, Feng-Cheng Yang +1 more | 2018-01-09 |
| 9570613 | Structure and formation method of FinFET device | Cheng-Yu Yang, Hsiang-Ku Shen, Han-Ting Tsai, Yimin Huang | 2017-02-14 |
| 9496264 | Structure and formation method of FinFET device | Cheng-Yu Yang, Hsiang-Ku Shen, Han-Ting Tsai, Yimin Huang | 2016-11-15 |
| 9449882 | Semiconductor device and manufacturing method thereof | Sheng-Chen Wang, Sai-Hooi Yeong, Chia-Ta Yu | 2016-09-20 |