Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6440863 | Plasma etch method for forming patterned oxygen containing plasma etchable layer | Chao-Cheng Chen, Hun-Jan Tao | 2002-08-27 |
| 5521121 | Oxygen plasma etch process post contact layer etch back | Pin-Nan Tseng, Jiunn-Wen Weng | 1996-05-28 |