Issued Patents All Time
Showing 76–100 of 392 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11158545 | Methods of forming isolation features in metal gates | Chang-Yin Chen, Chih-Han Lin | 2021-10-26 |
| 11158744 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Chang-Yin Chen, Yung-Jung Chang | 2021-10-26 |
| 11145510 | FinFET device over convex insulating structure | Po-Chi Wu, Chih-Han Lin, Horng-Huei Tseng | 2021-10-12 |
| 11139295 | Fin field effect transistor (FinFET) device and method | Chai-Wei Chang, Po-Chi Wu, Yi-Cheng Chao | 2021-10-05 |
| 11127586 | Source and drain process for FinFET | Chih-Han Lin, Horng-Huei Tseng | 2021-09-21 |
| 11121130 | Structure and formation method of semiconductor device with gate stacks | Chih-Han Lin, Horng-Huei Tseng | 2021-09-14 |
| 11120974 | Semiconductor device | Chang-Yin Chen, Tung-Wen Cheng, Jr-Jung Lin, Chih-Han Lin | 2021-09-14 |
| 11075112 | Method of forming interconnection structure | Chih-Han Lin | 2021-07-27 |
| 11043593 | Semiconductor device and manufacturing method thereof | Cheng-Yen Yu, Tung-Wen Cheng, Zhe Zhang, Bo-Feng Young | 2021-06-22 |
| 11043408 | Method of forming FinFET devices with embedded air gaps | Chih-Han Lin | 2021-06-22 |
| 11018261 | Fin field effect transistor | Chih-Han Lin, Horng-Huei Tseng | 2021-05-25 |
| 11018019 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2021-05-25 |
| 11004846 | Enlarging spacer thickness by forming a dielectric layer over a recessed interlayer dielectric | Chih-Han Lin, Horng-Huei Tseng | 2021-05-11 |
| 11004795 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2021-05-11 |
| 10998428 | Integrated circuit device fins | Chih-Han Lin, Wei-Chiang Hung, Wei-Hao Huang | 2021-05-04 |
| 10998313 | Source/drain regions in fin field effect transistors (finFETs) and methods of forming same | Chih-Han Lin, Horng-Huei Tseng | 2021-05-04 |
| 10998312 | Semiconductor device and manufacturing method thereof | Chih-Han Lin | 2021-05-04 |
| 10998226 | Method of forming interconnection structure with anti-adhesion liner | Chih-Han Lin | 2021-05-04 |
| 10985055 | Interconnection structure with anti-adhesion layer | Chih-Han Lin | 2021-04-20 |
| 10978450 | FinFET isolation structure and method for fabricating the same | Chih-Han Lin | 2021-04-13 |
| 10964819 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Tung-Wen Cheng, Yung-Jung Chang | 2021-03-30 |
| 10957777 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2021-03-23 |
| 10943901 | Semiconductor device and method | Chih-Han Lin, Horng-Huei Tseng | 2021-03-09 |
| 10923353 | Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same | Chang-Yin Chen, Tung-Wen Cheng, Chun-Lung Ni, Jr-Jung Lin, Chih-Han Lin | 2021-02-16 |
| 10879364 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2020-12-29 |