YH

Yuichi Hamada

SY Sysmex: 32 patents #3 of 868Top 1%
SC Shin-Etsu Chemical Co.: 30 patents #139 of 2,176Top 7%
IL Isuzu Motors Limited: 1 patents #414 of 908Top 50%
MJ Mahle Filter Systems Japan: 1 patents #43 of 115Top 40%
Nichia: 1 patents #1,005 of 1,531Top 70%
TC Teijin Frontier Co.: 1 patents #12 of 41Top 30%
Overall (All Time): #33,405 of 4,157,543Top 1%
65
Patents All Time

Issued Patents All Time

Showing 51–65 of 65 patents

Patent #TitleCo-InventorsDate
7488560 Large pellicle 2009-02-10
6436586 Pellicle with a filter and method for production thereof Takashi Matsuoka, Meguru Kashida 2002-08-20
5965294 Hydrogen absorbing alloy electrode Yoshihiro Kubota, Hiroto Sugahara 1999-10-12
5723860 Frame-supported pellicle for photomask protection Meguru Kashida 1998-03-03
5693382 Frame-supported pellicle for dustproof protection of photomask in photolithography Satoshi Kawakami, Toru Shirasaki, Yoshihiko Nagata, Meguru Kashida, Yoshihiro Kubota 1997-12-02
5691088 Pellicle for protection of photolithographic mask Yoshihiro Kubota, Meguru Kashida, Yoshihiko Nagata, Hitoshi Noguchi, Kimitaka Kumagae 1997-11-25
5616927 Frame-supported pellicle for dustproof protection of photomask Yoshihiro Kubota, Satoshi Kawakami, Toru Shirasaki, Yoshihiko Nagata, Meguru Kashida 1997-04-01
5597669 Frame-supported pellicle for photolithography Meguru Kashida, Yoshihiro Kubota 1997-01-28
5470621 Frame-supported pellicle for dustproof protection of photomask Meguru Kashida, Toru Shirasaki, Yoshihiko Nagata, Sakae Kawaguchi, Yoshihiro Kubota 1995-11-28
5419972 Frame-supported pellicle for dustproof protection of photomask Sakae Kawaguchi, Toru Shirasaki, Yoshihiko Nagata, Meguru Kashida, Yoshihiro Kubota 1995-05-30
5378514 Frame-supported pellicle for photolithography Yoshihiko Nagata, Meguru Kashida, Yoshihiro Kubota 1995-01-03
5370951 Frame-supported pellicle for protection of photolithographic mask Yoshihiro Kubota, Meguru Kashida, Hirofumi Kishita, Shinichi Sato, Kouichi Yamaguchi 1994-12-06
5368675 Method for the preparation of a frame-supported pellicle for photolithography Yoshihiko Nagata, Meguru Kashida, Yoshihiro Kubota 1994-11-29
5327808 Method for the preparation of a frame-supported pellicle for photolithography Yoshihiko Nagata, Meguru Kashida, Yoshihiro Kubota 1994-07-12
5300348 Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive Yoshihiro Kubota, Meguru Kashida, Yoshihiko Nagata, Hitoshi Noguchi, Shinichi Sato +1 more 1994-04-05