YN

Yoshihiko Nagata

SC Shin-Etsu Chemical Co.: 28 patents #154 of 2,176Top 8%
MI Ministry Of International Trade & Industry: 1 patents #189 of 582Top 35%
NC Nihon Spindle Manufacturing Co.: 1 patents #17 of 47Top 40%
SI Sumitomo Heavy Industries: 1 patents #424 of 917Top 50%
AT Agency Of Industrial Science And Technology: 1 patents #568 of 1,778Top 35%
📍 Tsukuba, JP: #73 of 2,818 inventorsTop 3%
Overall (All Time): #118,169 of 4,157,543Top 3%
31
Patents All Time

Issued Patents All Time

Showing 1–25 of 31 patents

Patent #TitleCo-InventorsDate
11446844 Kneading device with a detection unit detecting a dispersion degree Hisashi Saito, Takamasa Kishima 2022-09-20
8956788 Pellicle for lithography and a method of making thereof 2015-02-17
8590281 Method for hermetically closing an air-tight bag for pellicle 2013-11-26
8273507 Pellicle for lithography and a method for making the same 2012-09-25
8192899 Pellicle for photolithography 2012-06-05
7927763 Pellicle for photolithography and pellicle frame 2011-04-19
7604904 Pellicle for lithography 2009-10-20
7432023 Method for producing a pellicle for lithography 2008-10-07
7067222 Pellicle for lithography 2006-06-27
6396579 Method, apparatus, and system for inspecting transparent objects Mitsuru Hayamizu 2002-05-28
5693382 Frame-supported pellicle for dustproof protection of photomask in photolithography Yuichi Hamada, Satoshi Kawakami, Toru Shirasaki, Meguru Kashida, Yoshihiro Kubota 1997-12-02
5691088 Pellicle for protection of photolithographic mask Yoshihiro Kubota, Meguru Kashida, Hitoshi Noguchi, Yuichi Hamada, Kimitaka Kumagae 1997-11-25
5616927 Frame-supported pellicle for dustproof protection of photomask Yoshihiro Kubota, Satoshi Kawakami, Yuichi Hamada, Toru Shirasaki, Meguru Kashida 1997-04-01
5540577 Injection molding machine capable of reducing the work required to an operator Atsushi Ishikawa, Yoshiyuki Imatomi, Kazuo Hiraoka, Hitoshi Hara 1996-07-30
5470621 Frame-supported pellicle for dustproof protection of photomask Meguru Kashida, Toru Shirasaki, Yuichi Hamada, Sakae Kawaguchi, Yoshihiro Kubota 1995-11-28
5419972 Frame-supported pellicle for dustproof protection of photomask Sakae Kawaguchi, Yuichi Hamada, Toru Shirasaki, Meguru Kashida, Yoshihiro Kubota 1995-05-30
5378514 Frame-supported pellicle for photolithography Yuichi Hamada, Meguru Kashida, Yoshihiro Kubota 1995-01-03
5368675 Method for the preparation of a frame-supported pellicle for photolithography Yuichi Hamada, Meguru Kashida, Yoshihiro Kubota 1994-11-29
5327808 Method for the preparation of a frame-supported pellicle for photolithography Yuichi Hamada, Meguru Kashida, Yoshihiro Kubota 1994-07-12
5326649 X-ray transmitting membrane for mask in x-ray lithography and method for preparing the same Meguru Kashida, Hitoshi Noguchi 1994-07-05
5308567 Method for the preparation of a resin membrane Meguru Kashida, Yoshihiro Kubota, Hitoshi Noguchi 1994-05-03
5300348 Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive Yoshihiro Kubota, Meguru Kashida, Hitoshi Noguchi, Yuichi Hamada, Shinichi Sato +1 more 1994-04-05
5286567 Pellicle for photolithographic mask Yoshihiro Kubota, Meguru Kashida, Hitoshi Noguchi 1994-02-15
5246802 X-ray permeable membrane for X-ray lithographic mask Meguru Kashida, Yoshihiro Kubota, Hitoshi Noguchi 1993-09-21
5234609 X-ray permeable membrane for X-ray lithographic mask Meguru Kashida, Hitoshi Noguchi 1993-08-10