Issued Patents All Time
Showing 51–67 of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6124160 | Semiconductor device and method for manufacturing the same | Mizuki Segawa, Toshiki Yabu, Takashi Uehara, Kyoji Yamashita, Takaaki Ukeda +2 more | 2000-09-26 |
| 6114095 | Method of manufacturing electronic device using phase-shifting mask with multiple phase-shift regions | Koji Matsuoka | 2000-09-05 |
| 6093592 | Method of manufacturing a semiconductor apparatus having a silicon-on-insulator structure | Chiaki Kudo | 2000-07-25 |
| 5960300 | Method of manufacturing semiconductor device | Toshiki Yabu, Takashi Uehara, Mizuki Segawa | 1999-09-28 |
| 5946563 | Semiconductor device and method of manufacturing the same | Takashi Uehara, Toshiki Yabu, Mizuki Segawa, Minoru Fujii | 1999-08-31 |
| 5925912 | Semiconductor apparatus having a conductive sidewall structure | Masatoshi Arai | 1999-07-20 |
| 5903031 | MIS device, method of manufacturing the same, and method of diagnosing the same | Takayuki Yamada, Masatoshi Arai, Toshiki Yabu, Koji Eriguchi | 1999-05-11 |
| 5879983 | Semiconductor device and method for manufacturing the same | Mizuki Segawa, Toshiki Yabu, Takashi Uehara, Kyoji Yamashita, Takaaki Ukeda +2 more | 1999-03-09 |
| 5756382 | Manufacturing method of CMOS transistor | Mizuki Segawa, Yoshiaki Kato, Hiroaki Nakaoka, Atsushi Hori, Hiroshi Masuda +4 more | 1998-05-26 |
| 5736421 | Semiconductor device and associated fabrication method | Hiroshi Shimomura, Kiyoyuki Morita, Takashi Uehara, Mitsuo Yasuhira, Mizuki Segawa +1 more | 1998-04-07 |
| 5726071 | Manufacturing method of CMOS transistor | Mizuki Segawa, Yoshiaki Kato, Hiroaki Nakaoka, Atsushi Hori, Hiroshi Masuda +4 more | 1998-03-10 |
| 5698902 | Semiconductor device having finely configured gate electrodes | Takashi Uehara, Toshiki Yabu, Mizuki Segawa, Minoru Fujii | 1997-12-16 |
| 5686340 | Manufacturing method of CMOS transistor | Mizuki Segawa, Yoshiaki Kato, Hiroaki Nakaoka, Atsushi Hori, Hiroshi Masuda +4 more | 1997-11-11 |
| 5618748 | Manufacturing method of CMOS transistor with no reduction of punch-through voltage | Mizuki Segawa, Yoshiaki Kato, Hiroaki Nakaoka, Atsushi Hori, Hiroshi Masuda +4 more | 1997-04-08 |
| 5498908 | Semiconductor apparatus having an n-channel MOS transistor and a p-channel MOS transistor and method for manufacturing the semiconductor apparatus | Takashi Uehara, Akihira Shinohara | 1996-03-12 |
| 5447872 | Manufacturing method of CMOS transistor including heat treatments of gate electrodes and LDD regions at reducing temperatures | Mizuki Segawa, Yoshiaki Kato, Hiroaki Nakaoka, Atsushi Hori, Hiroshi Masuda +4 more | 1995-09-05 |
| 5409847 | Manufacturing method of CMOS transistor in which heat treatment at higher temperature is done prior to heat treatment at low temperature | Mizuki Segawa, Yoshiaki Kato, Hiroaki Nakaoka, Atsushi Hori, Hiroshi Masuda +4 more | 1995-04-25 |