KY

Kazuhiro Yamashita

Sumitomo Electric Industries: 14 patents #1,767 of 21,551Top 9%
EX Exedy: 7 patents #40 of 223Top 20%
Fujitsu Limited: 6 patents #5,180 of 24,456Top 25%
LC Lapis Semiconductor Co.: 5 patents #37 of 349Top 15%
AD Advantest: 3 patents #330 of 1,193Top 30%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
WI Wako Pure Chemical Industries: 2 patents #86 of 377Top 25%
OC Oki Electric Industry Co.: 1 patents #1,459 of 2,807Top 55%
DA Daicel: 1 patents #265 of 523Top 55%
MC Mikasa Sangyo Co.: 1 patents #9 of 35Top 30%
Overall (All Time): #72,600 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 26–42 of 42 patents

Patent #TitleCo-InventorsDate
6171192 Flywheel assembly employing a damper mechanism having an annular chamber filled with a dry lubricant Hirotaka Fukushima 2001-01-09
5783342 Method and system for measurement of resist pattern Masahiro Muro 1998-07-21
5780206 Fine pattern forming process using a resist composition sensitive to deep ultraviolet light Fumiyoshi Urano, Takanori Yasuda, Akiko Katsuyama 1998-07-14
5741628 Method of forming micropatterns by having a resist film absorb water Takahiro Matsuo, Masayuki Endo, Masaru Sasago 1998-04-21
5695910 Resist composition for deep ultraviolet light Fumiyoshi Urano, Takanori Yasuda, Akiko Katsuyama 1997-12-09
5679500 Method of forming micropatterns utilizing silylation and overall energy beam exposure Takahiro Matsuo, Masayuki Endo, Masaru Sasago 1997-10-21
5658711 Method of forming micropatterns Takahiro Matsuo, Masayuki Endo, Masaru Sasago 1997-08-19
5590137 Semiconductor IC tester 1996-12-31
5518579 Method for forming a fine pattern Akiko Katsuyama, Masaru Sasago 1996-05-21
5465066 Waveform formatter Toshiyuki Negishi, Masatoshi Sato, Hiroshi Tsukahara 1995-11-07
5252414 Evaluation method of resist coating Hironao Iwai, Noboru Nomura 1993-10-12
5191465 Optical apparatus for alignment of reticle and wafer in exposure apparatus Noboru Nomura 1993-03-02
5186788 Fine pattern forming method Kazuhiko Hashimoto, Noboru Nomura 1993-02-16
4870289 Apparatus for controlling relation in position between a photomask and a wafer Takeo Sato, Shinichiro Aoki, Katsumasa Yamaguchi, Tadashi Kaneko, Noboru Nomura +1 more 1989-09-26
4828392 Exposure apparatus Noboru Nomura, Takayoshi Matsumura, Midori Yamaguchi 1989-05-09
4771180 Exposure apparatus including an optical system for aligning a reticle and a wafer Noboru Nomura 1988-09-13
4764206 Contradeglutitious solid herbicidal composition Mamoru Yoshida 1988-08-16