Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12278102 | Semiconductor device with silicon nitride passivation film | Masaya Okada, Kazutaka Inoue, Takumi YONEMURA | 2025-04-15 |
| 11430653 | Method of manufacturing high electron mobility transistor and high electron mobility transistor | Takuji YAMAMURA, Kenya NISHIGUCHI | 2022-08-30 |
| 10832905 | Process of forming silicon nitride (SiN) film and semiconductor device providing SiN film | — | 2020-11-10 |
| 10741384 | Process of forming silicon nitride film | — | 2020-08-11 |
| 10566184 | Process of depositing silicon nitride (SiN) film on nitride semiconductor | — | 2020-02-18 |
| 10283609 | Semiconductor device | — | 2019-05-07 |
| 9425348 | Group III nitride semiconductor device, and method for fabricating group III nitride semiconductor device | Nobuhiro Saga, Shinji Tokuyama, Takashi Kyono, Koji Katayama, Tatsushi Hamaguchi +1 more | 2016-08-23 |
| 8507305 | Group-III nitride semiconductor laser device, method of fabricating group-III nitride semiconductor laser device, and epitaxial substrate | Yusuke Yoshizumi, Yohei Enya, Takashi Kyono, Takamichi Sumitomo, Nobuhiro Saga +6 more | 2013-08-13 |
| 8502310 | III nitride semiconductor electronic device, method for manufacturing III nitride semiconductor electronic device, and III nitride semiconductor epitaxial wafer | Hiromu Shiomi, Yu Saitoh, Makoto Kiyama | 2013-08-06 |
| 8349078 | Method of forming nitride semiconductor epitaxial layer and method of manufacturing nitride semiconductor device | Hiromu Shiomi, Yu Saitoh, Akihiro Hachigo, Makoto Kiyama, Seiji Nakahata | 2013-01-08 |