Issued Patents All Time
Showing 76–91 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7208394 | Method of manufacturing a semiconductor device with a fluorine concentration | Taketomi Asami, Satoshi Toriumi | 2007-04-24 |
| 7199027 | Method of manufacturing a semiconductor film by plasma CVD using a noble gas and nitrogen | Taketomi Asami, Noriyoshi Suzuki, Shunpei Yamazaki | 2007-04-03 |
| 7169689 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Taketomi Asami, Toru Mitsuki, Yoko Kanakubo | 2007-01-30 |
| 7109074 | Method of manufacturing a semiconductor device | Taketomi Asami, Noriyoshi Suzuki | 2006-09-19 |
| 7034337 | Semiconductor device and method of manufacturing the same | Taketomi Asami, Satoshi Toriumi, Takashi Ohtsuki, Toru Mitsuki, Kenji Kasahara +4 more | 2006-04-25 |
| 6875674 | Method of manufacturing a semiconductor device with fluorine concentration | Taketomi Asami, Satoshi Toriumi | 2005-04-05 |
| 6867077 | Semiconductor device and method of manufacturing the same | Misako Nakazawa, Toshiji Hamatani, Hideto Ohnuma, Naoki Makita | 2005-03-15 |
| 6821828 | Method of manufacturing a semiconductor device | Taketomi Asami, Noriyoshi Suzuki | 2004-11-23 |
| 6808968 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Osamu Nakamura, Masayuki Kajiwara, Junichi Koezuka, Koji Dairiki +4 more | 2004-10-26 |
| 6794229 | Manufacturing method for semiconductor device | Taketomi Asami, Satoshi Toriumi, Takashi Ohtsuki, Shunpei Yamazaki | 2004-09-21 |
| 6743700 | Semiconductor film, semiconductor device and method of their production | Taketomi Asami, Noriyoshi Suzuki, Hideto Ohnuma, Masato Yonezawa | 2004-06-01 |
| 6717181 | Luminescent device having thin film transistor | Satoshi Murakami, Taketomi Asami | 2004-04-06 |
| 6703265 | Semiconductor device and method of manufacturing the same | Taketomi Asami, Satoshi Toriumi, Takashi Ohtsuki, Toru Mitsuki, Kenji Kasahara +4 more | 2004-03-09 |
| 6675816 | Plasma CVD apparatus and dry cleaning method of the same | — | 2004-01-13 |
| 6506636 | Method of manufacturing a semiconductor device having a crystallized amorphous silicon film | Shunpei Yamazaki, Taketomi Asami, Toru Mitsuki, Yoko Kanakubo | 2003-01-14 |
| 5330578 | Plasma treatment apparatus | Mitsunori Sakama, Takeshi Fukada, Hisashi Abe | 1994-07-19 |