Issued Patents All Time
Showing 1–25 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9806096 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2017-10-31 |
| 9196632 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2015-11-24 |
| 8610182 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2013-12-17 |
| 8304350 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Hisashi Ohtani, Hiroyuki Shimada, Hisashi Abe, Satoshi Teramoto | 2012-11-06 |
| 8278195 | Plasma CVD apparatus | Shunpei Yamazaki, Toru Takayama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata | 2012-10-02 |
| 8154059 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2012-04-10 |
| 8053338 | Plasma CVD apparatus | Shunpei Yamazaki, Toru Takayama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata | 2011-11-08 |
| 7821071 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2010-10-26 |
| 7723218 | Plasma CVD apparatus | Shunpei Yamazaki, Toru Takayama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata | 2010-05-25 |
| 7691692 | Substrate processing apparatus and a manufacturing method of a thin film semiconductor device | Shunpei Yamazaki, Hisashi Ohtani, Hiroyuki Shimada, Hisashi Abe, Satoshi Teramoto | 2010-04-06 |
| 7504343 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2009-03-17 |
| 7491659 | APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical | Shunpei Yamazaki, Takeshi Fukada | 2009-02-17 |
| 7465679 | Insulating film and method of producing semiconductor device | Shunpei Yamazaki, Takeshi Fukada, Yukiko Uehara, Hiroshi Uehara | 2008-12-16 |
| 7452794 | Manufacturing method of a thin film semiconductor device | Shunpei Yamazaki, Hisashi Ohtani, Hiroyuki Shimada, Hisashi Abe, Satoshi Teramoto | 2008-11-18 |
| 7452829 | Plasma CVD method | Shunpei Yamazaki, Masaaki Hiroki | 2008-11-18 |
| 7393723 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Takeshi Fukada | 2008-07-01 |
| 7372114 | Semiconductor device, and method of fabricating the same | Noriko Ishimaru, Taketomi Asami, Shunpei Yamazaki | 2008-05-13 |
| 7271082 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Hisashi Ohtani, Hiroyuki Shimada, Hisashi Abe, Satoshi Teramoto | 2007-09-18 |
| 7166899 | Semiconductor device, and method of fabricating the same | Noriko Ishimaru, Taketomi Asami, Shunpei Yamazaki | 2007-01-23 |
| 7071128 | Plasma CVD method | Shunpei Yamazaki, Masaaki Hiroki | 2006-07-04 |
| 7064388 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2006-06-20 |
| 7038302 | Glass substrate assembly, semiconductor device and method of heat-treating glass substrate | Takeshi Fukada, Satoshi Teramoto | 2006-05-02 |
| 6951828 | Plasma CVD method | Shunpei Yamazaki, Masaaki Hiroki | 2005-10-04 |
| 6919282 | Method of fabricating a semiconductor device | Noriko Ishimaru, Taketomi Asami, Shunpei Yamazaki | 2005-07-19 |
| 6858898 | Semiconductor device and method for manufacturing the same | Masahiko Hayakawa, Satoshi Toriumi | 2005-02-22 |