Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8198683 | Semiconductor device including transistors with silicided impurity regions | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2012-06-12 |
| 7847355 | Semiconductor device including transistors with silicided impurity regions | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2010-12-07 |
| 7569856 | Semiconductor device and method for manufacturing the same | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2009-08-04 |
| 7525158 | Semiconductor device having pixel electrode and peripheral circuit | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2009-04-28 |
| 7465679 | Insulating film and method of producing semiconductor device | Shunpei Yamazaki, Takeshi Fukada, Mitsunori Sakama, Hiroshi Uehara | 2008-12-16 |
| 7381599 | Semiconductor device and method for manufacturing the same | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2008-06-03 |
| 6867431 | Semiconductor device and method for manufacturing the same | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2005-03-15 |
| 6303264 | Agent for reducing the substrate dependence of resist | Hirotoshi Fujie, Tohru Souki | 2001-10-16 |
| 6049092 | Semiconductor device and method for manufacturing the same | Toshimitsu Konuma, Akira Sugawara, Hongyong Zhang, Atsunori Suzuki, Hideto Ohnuma +4 more | 2000-04-11 |
| 6025630 | Insulating film formed using an organic silane and method of producing semiconductor device | Shunpei Yamazaki, Takeshi Fukada, Mitsunori Sakama, Hiroshi Uehara | 2000-02-15 |
| 5976988 | Etching material and etching method | Toshimitsu Konuma, Akira Sugawara, Takeshi Nishi, Satoshi Murakami, Misako Nakazawa | 1999-11-02 |
| 5885888 | Etching material and etching process | Toshimitsu Konuma, Akira Sugawara | 1999-03-23 |
| 5866932 | Insulating film formed using an organic silane and method of producing semiconductor device | Shunpei Yamazaki, Takeshi Fukada, Mitsunori Sakama, Hiroshi Uehara | 1999-02-02 |
| 5856853 | Short circuit preventing film of liquid crystal electro-optical device and manufacturing method thereof | Toshimitsu Konuma, Akira Sugawara | 1999-01-05 |
| 5837614 | Insulating film and method of producing semiconductor device | Shunpei Yamazaki, Takeshi Fukada, Mitsunori Sakama, Hiroshi Uehara | 1998-11-17 |
| 5830786 | Process for fabricating electronic circuits with anodically oxidized scandium doped aluminum wiring | Hongyong Zhang, Hideki Uochi, Shunpei Yamazaki, Yasuhiko Takemura, Minoru Miyazaki +3 more | 1998-11-03 |
| 5736434 | Method for manufacturing a semiconductor device utilizing an anodic oxidation | Toshimitsu Konuma, Akira Sugawara | 1998-04-07 |
| 5639344 | Etching material and etching process | Toshimitsu Konuma, Akira Sugawara | 1997-06-17 |
| 5595638 | Method for manufacturing a semiconductor device utilizing an anodic oxidation | Toshimitsu Konuma, Akira Sugawara | 1997-01-21 |
| 5580800 | Method of patterning aluminum containing group IIIb Element | Hongyong Zhang, Yasuhiko Takemura, Hideki Uochi, Itaru Koyama, Minoru Miyazaki +3 more | 1996-12-03 |