Issued Patents All Time
Showing 26–50 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6847097 | Glass substrate assembly, semiconductor device and method of heat-treating glass substrate | Takeshi Fukada, Satoshi Teramoto | 2005-01-25 |
| 6730992 | Semiconductor device and method of manufacturing the same | Noriko Ishimaru, Masahiko Miwa, Mitinori Iwai | 2004-05-04 |
| 6706648 | APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical | Shunpei Yamazaki, Takeshi Fukada | 2004-03-16 |
| 6703264 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Takeshi Fukada | 2004-03-09 |
| 6680817 | Recording medium device containing recording medium and recording/reproducing device | Yasuaki Kano, Kazuyuki Hirooka, Kazuya Koseki, Takao Hiramoto, Masahiro Kiyota +1 more | 2004-01-20 |
| 6673659 | Semiconductor device and method of producing the same | Noriko Ishimaru, Masahiko Miwa, Michinori Iwai | 2004-01-06 |
| 6634562 | Recording and reproducing apparatus, recording medium adapter apparatus, and recording and reproducing method | Masahiko Noro, Atsuhiro Kumagai | 2003-10-21 |
| 6635589 | Methods of heat treatment and heat treatment apparatus for silicon oxide films | Shunpei Yamazaki, Yasuhiko Takemura, Tomohiko Sato, Satoshi Teramoto, Shigefumi Sakai | 2003-10-21 |
| 6632708 | Semiconductor device and method of manufacturing the same | Noriko Ishimaru, Masahiko Miwa, Mitinori Iwai | 2003-10-14 |
| 6593235 | Semiconductor device with a tapered hole formed using multiple layers with different etching rates | Hideki Uochi, Masahiko Hayakawa, Toshimitsu Konuma, Shunpei Yamazaki | 2003-07-15 |
| 6521912 | Semiconductor device | Noriko Ishimaru, Taketomi Asami, Shunpei Yamazaki | 2003-02-18 |
| 6499427 | Plasma CVD apparatus | Shunpei Yamazaki, Toru Takayama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata | 2002-12-31 |
| 6482752 | Substrate processing apparatus and method and a manufacturing method of a thin film semiconductor device | Shunpei Yamazaki, Hisashi Ohtani, Hiroyuki Shimada, Hisashi Abe, Satoshi Teramoto | 2002-11-19 |
| 6396078 | Semiconductor device with a tapered hole formed using multiple layers with different etching rates | Hideki Uochi, Masahiko Hayakawa, Toshimitsu Konuma, Shunpei Yamazaki | 2002-05-28 |
| 6337229 | Method of making crystal silicon semiconductor and thin film transistor | Shunpei Yamazaki, Yasuhiko Takemura | 2002-01-08 |
| 6323142 | APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical | Shunpei Yamazaki, Takeshi Fukada | 2001-11-27 |
| 6283060 | Plasma CVD apparatus | Shunpei Yamazaki, Toru Takayama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata | 2001-09-04 |
| 6281147 | Plasma CVD method | Shunpei Yamazaki, Masaaki Hiroki | 2001-08-28 |
| 6268631 | Glass substrate assembly, semiconductor device and method of heat-treating glass substrate | Takeshi Fukada, Satoshi Teramoto | 2001-07-31 |
| 6228751 | Method of manufacturing a semiconductor device | Shunpei Yamazaki, Takeshi Fukada | 2001-05-08 |
| 6160679 | Recording medium device for use with a tape cartridge having an auxiliary memory viewable through a cartridge discrimination opening | Katsumi Maekawa, Joichi Daiba, Satoshi Ota, Toshiya Kurokawa, Masanori Abe +1 more | 2000-12-12 |
| 6025630 | Insulating film formed using an organic silane and method of producing semiconductor device | Shunpei Yamazaki, Takeshi Fukada, Yukiko Uehara, Hiroshi Uehara | 2000-02-15 |
| 6015762 | Plasma CVD method | Shunpei Yamazaki, Masaaki Hiroki | 2000-01-18 |
| 5970384 | Methods of heat treating silicon oxide films by irradiating ultra-violet light | Shunpei Yamazaki, Yasuhiko Takemura, Tomohiko Sato, Satoshi Teramoto, Shigefumi Sakai | 1999-10-19 |
| 5929487 | Glass substrate assembly, semiconductor device and method of heat-treating glass substrate | Takeshi Fukada, Satoshi Teramoto | 1999-07-27 |