HM

Hotaka Maruyama

SL Semiconductor Energy Laboratory: 40 patents #234 of 1,113Top 25%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
📍 Tochigi, JP: #75 of 2,789 inventorsTop 3%
Overall (All Time): #72,763 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 1–25 of 42 patents

Patent #TitleCo-InventorsDate
12057511 Light-emitting device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2024-08-06
11997859 Light-emitting device and manufacturing method thereof Shingo Eguchi, Yoshiaki Oikawa, Kenichi OKAZAKI 2024-05-28
11626521 Light-emitting device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2023-04-11
11469387 Light-emitting device and manufacturing method thereof Shingo Eguchi, Yoshiaki Oikawa, Kenichi OKAZAKI 2022-10-11
11171298 Light-emitting device and manufacturing method thereof Shingo Eguchi, Yoshiaki Oikawa, Kenichi OKAZAKI 2021-11-09
11024747 Light-emitting device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2021-06-01
10720328 Etching method and etching apparatus Katsunori Tanaka 2020-07-21
10672915 Light-emitting device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2020-06-02
10374184 Light-emitting device and manufacturing method thereof Shingo Eguchi, Yoshiaki Oikawa, Kenichi OKAZAKI 2019-08-06
10297679 Method for manufacturing semiconductor device Yoshiaki Oikawa, Kenichi OKAZAKI 2019-05-21
10243005 Semiconductor device and manufacturing method thereof Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2019-03-26
9887276 Method for manufacturing semiconductor device having oxide semiconductor Yoshiaki Oikawa, Kenichi OKAZAKI 2018-02-06
9865471 Etching method and etching apparatus Gaku Shimoda, Takanori Sato, Masafumi Urakawa, Masahiro Ogasawara 2018-01-09
9837442 Semiconductor device comprising a plurality of N-channel transistors wherein the oxide semiconductor layer comprises a portion being in an oxygen-excess state Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI +1 more 2017-12-05
9666820 Light-emitting device and manufacturing method thereof Shingo Eguchi, Yoshiaki Oikawa, Kenichi OKAZAKI 2017-05-30
9583509 Semiconductor device wherein an oxide semiconductor layer has a degree of crystallization of 80% or more Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI +1 more 2017-02-28
9537012 Semiconductor device with oxide semiconductor layer Shunpei Yamazaki, Junichiro Sakata, Kosei Noda, Masayuki Sakakura, Yoshiaki Oikawa 2017-01-03
9466756 Semiconductor device and manufacturing method thereof Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2016-10-11
9431427 Semiconductor device comprising oxide semiconductor layer Yoshiaki Oikawa, Hiromichi Godo, Daisuke Kawae, Shunpei Yamazaki 2016-08-30
9431465 Light-emitting device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2016-08-30
9391095 Semiconductor device and manufacturing method thereof Shunpei Yamazaki, Yoshiaki Oikawa, Katsuaki TOCHIBAYASHI 2016-07-12
9153602 Semiconductor device wherein an oxide semiconductor layer comprises a crystal and has a degree of crystallization of 80% or more Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI +1 more 2015-10-06
9130041 Semiconductor device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Kosei Noda, Masayuki Sakakura, Yoshiaki Oikawa 2015-09-08
8957411 Light-emitting device and method for manufacturing the same Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI 2015-02-17
8885115 Semiconductor device wherein each of a first oxide semiconductor layer and a second oxide semiconductor layer includes a portion that is in an oxygen-excess state and is in contact with an insulating layer Shunpei Yamazaki, Junichiro Sakata, Masayuki Sakakura, Yoshiaki Oikawa, Kenichi OKAZAKI +1 more 2014-11-11