Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D648693 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-11-15 |
| D646252 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-10-04 |
| D646253 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-10-04 |
| D646254 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-10-04 |
| D646249 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-10-04 |
| D645017 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-09-13 |
| D645019 | Mobile phone | Bo-Ra Kim, Chang-Hwan Hwang | 2011-09-13 |
| 7151039 | Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same | In Sung Park, Gi-Vin Im, Ki-Yeon Park, Jae-Hyun Yeo | 2006-12-19 |
| 6946342 | Semiconductor device and method for manufacturing the same | Jae-Hyun Yeo, Sung Tae Kim, Young Sun Kim, In Sung Park, Seok-Jun Won +2 more | 2005-09-20 |
| 6893915 | Semiconductor device having barrier layer between ruthenium layer and metal layer and method for manufacturing the same | Hee-Sook Park, Gil-Heyun Choi, Seung Hwan Lee | 2005-05-17 |
| 6893501 | Method for manufacturing a semiconductor device having a capping layer covering a capacitor of the semiconductor device | Ki-Chul Kim, Sung Tae Kim, Young Sun Kim, Jeong-hee Chung, Wan-don Kim +1 more | 2005-05-17 |
| 6849517 | Methods of forming capacitors including reducing exposed electrodes in semiconductor devices | Jung-hee Chung, Young Sun Kim, Han-Mei Choi | 2005-02-01 |
| 6680251 | Methods of chemical vapor depositing ruthenium by varying chemical vapor deposition parameters | Seok-Jun Won, Cha-young Yoo, Sung Tae Kim, Young-Wook Park, Soon-yeon Park | 2004-01-20 |
| 6599807 | Method for manufacturing capacitor of semiconductor device having improved leakage current characteristics | Jae-Soon Lim, Seung Hwan Lee, Han-Mei Choi, Gab-Jin Nam, Ki-Yeon Park +2 more | 2003-07-29 |
| 6472319 | Method for manufacturing capacitor of semiconductor memory device by two-step thermal treatment | Seok-Jun Won, Soon-yeon Park, Cha-young Yoo, Doo-sup Hwang, Eun-Ae Chung +1 more | 2002-10-29 |