Issued Patents All Time
Showing 51–62 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6889447 | Method for drying a wafer and apparatus for performing the same | Kwang-Wook Lee, In-Seak Hwang | 2005-05-10 |
| 6875706 | Cleaning solution and method of cleaning a semiconductor device using the same | Kwang-Wook Lee, Dae-Hyuk Chung, In-Seak Hwang | 2005-04-05 |
| 6838330 | Method of forming a contact hole of a semiconductor device | Bong-Ho Moon, Ju-Yun Cheol, In-Seak Hwang | 2005-01-04 |
| 6831012 | Method for forming a silicide film of a semiconductor device | Dae-Keun Kang, In-Seak Hwang, Byoung-Moon Yoon | 2004-12-14 |
| 6802911 | Method for cleaning damaged layers and polymer residue from semiconductor device | Keum-Joo Lee, In-Seak Hwang | 2004-10-12 |
| 6638855 | Method of filling contact hole of semiconductor device | Kyu-hwan Chang, Chang-Lyong Song, Seung-pil Chong | 2003-10-28 |
| 6399552 | Aqueous cleaning solution for removing contaminants surface of circuit substrate cleaning method using the same | Kwang-Wook Lee, Kun-Tack Lee, Chang-Lyong Song | 2002-06-04 |
| 6369008 | Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same | Heon-jae Ha, Dae-Hyuk Chung, In-Seak Hwang | 2002-04-09 |
| 6331478 | Methods for manufacturing semiconductor devices having chamfered metal silicide layers | Keum-Joo Lee, In-Seak Hwang, Chang-Iyoung Song | 2001-12-18 |
| 6117350 | Adjustable selectivity etching solutions and methods of etching semiconductor devices using the same | Byoung-Moon Yoon, Young Min Kwon, Myung Jun Park | 2000-09-12 |
| 6080673 | Chemical mechanical polishing methods utilizing pH-adjusted polishing solutions | Chang-Ki Hong | 2000-06-27 |
| 5855077 | Apparatus for drying semiconductor wafers using isopropyl alcohol | Chang-Hyun Nam | 1999-01-05 |