TO

Thomas Oszinda

Samsung: 8 patents #15,984 of 75,807Top 25%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
OG Osram Oled Gmbh: 2 patents #242 of 564Top 45%
AM AMD: 1 patents #5,683 of 9,279Top 65%
IA Infineon Technologies Austria Ag: 1 patents #668 of 1,126Top 60%
Overall (All Time): #341,121 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
11581369 Semiconductor switch element and method of manufacturing the same Sylvain Leomant, Gerhard Noebauer, Christian Gruber, Sergey Ananiev 2023-02-14
11322655 Method for producing an optoelectronic component, and optoelectronic component Attila Molnar, Fabian Kopp 2022-05-03
11011504 Optoelectronic semiconductor chip and method of producing an optoelectronic semiconductor chip Ban Loong Chris NG 2021-05-18
10867923 Semiconductor device Sang-Hoon Ahn, Tae-Soo Kim, Jong-Min Baek, Woo Kyung You, Byung-Hee Kim +1 more 2020-12-15
10128148 Methods for fabricating semiconductor devices including surface treatment processes Viet Ha Nguyen, Nae-In Lee, Byung-Hee Kim, Jong-Min Baek, Tae Jin Yim 2018-11-13
10096549 Semiconductor devices having interconnection structure Byung-Hee Kim, Deok-Young Jung, Jong-Min Baek, Tae Jin Yim 2018-10-09
9972528 Semiconductor devices VietHa Nguyen, Jongmin Baek, Sanghoon Ahn, Byunghee Kim, Wookyung You +1 more 2018-05-15
9929098 Copper via with barrier layer and cap layer Tae Jin Yim, Sang-Hoon Ahn, Jong-Min Baek, Byung-Hee Kim, Nae-In Lee +1 more 2018-03-27
9666478 Methods of forming wiring structures and methods of manufacturing semiconductor devices Tae Jin Yim, Sang-Hoon Ahn, Nae-In Lee 2017-05-30
9653400 Semiconductor device and method of manufacturing the same Tae Jin Yim, Woo Kyung You, Jong-Min Baek, Sang-Hoon Ahn, Kee-Young Jun 2017-05-16
9576848 Method of treating a porous dielectric layer and a method of fabricating a semiconductor device using the same Taejin Yim, Byunghee Kim, Sanghoon Ahn, Naein Lee, Keeyoung Jun 2017-02-21
8575041 Repair of damaged surface areas of sensitive low-K dielectrics of microstructure devices after plasma processing by in situ treatment Matthias Schaller, Daniel Fischer 2013-11-05
8440579 Re-establishing surface characteristics of sensitive low-k dielectrics in microstructure device by using an in situ surface modification Matthias Schaller, Daniel Fischer 2013-05-14
8423320 Method and system for quantitative inline material characterization in semiconductor production processes based on structural measurements and related models Matthias Schaller, Christin Bartsch, Daniel Fischer 2013-04-16