Issued Patents All Time
Showing 26–35 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7241552 | Resist composition comprising photosensitive polymer having lactone in its backbone | Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sang-Gyun Woo +1 more | 2007-07-10 |
| 7084227 | Photosensitive polymer and chemically amplified photoresist composition containing the same | Dong-won Jung, Sang-jun Choi, Si-hyeung Lee | 2006-08-01 |
| 7045267 | Resist composition comprising photosensitive polymer having lactone in its backbone | Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sang-Gyun Woo +1 more | 2006-05-16 |
| 6893793 | Photosensitive polymer and chemically amplified photoresist composition containing the same | Dong-won Jung, Sang-jun Choi, Si-hyeung Lee | 2005-05-17 |
| 6642336 | Photosensitive polymer | Ki Young Kwon, Si-hyeung Lee, Kwang-Sub Yoon, Hyun-Woo Kim, Dong-won Jung +2 more | 2003-11-04 |
| 6596459 | Photosensitive polymer and resist composition containing the same | Hyun-Woo Kim, Ki Young Kwon, Si-hyeung Lee, Dong-won Jung, Kwang-Sub Yoon +2 more | 2003-07-22 |
| 6593441 | Photosensitive polymer and chemically amplified photoresist composition containing the same | Dong-won Jung, Sang-jun Choi, Si-hyeung Lee | 2003-07-15 |
| 6537727 | Resist composition comprising photosensitive polymer having loctone in its backbone | Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sang-Gyun Woo +1 more | 2003-03-25 |
| 6497987 | Photosensitive lithocholate derivative and chemically amplified photoresist composition containing the same | Hyun-Woo Kim, Sang-Gyun Woo | 2002-12-24 |
| 6472120 | Photosensitive polymer and chemically amplified photoresist composition containing the same | Dong-won Jung, Sang-jun Choi, Si-hyeung Lee | 2002-10-29 |