TT

Toshihiko Takakura

Rohm Co.: 24 patents #73 of 2,292Top 4%
HI Hitachi: 11 patents #3,813 of 28,497Top 15%
HE Hitachi Micro Computer Engineering: 2 patents #45 of 393Top 15%
HA Hatachi: 1 patents #1 of 40Top 3%
📍 Koganei, JP: #16 of 449 inventorsTop 4%
Overall (All Time): #90,937 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 26–37 of 37 patents

Patent #TitleCo-InventorsDate
5680170 Thermal printhead Hideo Taniguchi, Hideaki Hoki, Masatoshi Nakanishi 1997-10-21
5514524 Method of making thermal printhead Hiroaki Ohnishi, Toshiyuki Fujita 1996-05-07
5200348 Method of manufacturing semiconductor device with constant width deep groove isolation Akihisa Uchida, Daisuke Okada, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura 1993-04-06
5141888 Process of manufacturing semiconductor integrated circuit device having trench and field isolation regions Mikinori Kawaji, Akihisa Uchida, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba +2 more 1992-08-25
5084402 Method of fabricating a semiconductor substrate, and semiconductor device, having thick oxide films and groove isolation Akihisa Uchida, Daisuke Okaka, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura 1992-01-28
5011788 Process of manufacturing semiconductor integrated circuit device and product formed thereby Mikinori Kawaji, Akihisa Uchida, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba +2 more 1991-04-30
4907063 Semiconductor body, and device formed therefrom, having grooves with silicon nitride on the groove surfaces Daisuke Okada, Akihisa Uchida, Shinji Nakashima, Nobuhiko Ohno, Katsumi Ogiue 1990-03-06
4853343 Method for fabricating a semiconductor integrated circuit device having thick oxide films and groove etch and refill Akihisa Uchida, Daisuke Okada, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura 1989-08-01
4819054 Semiconductor IC with dual groove isolation Mikinori Kawaji, Akihisa Uchida, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba +2 more 1989-04-04
4746963 Isolation regions formed by locos followed with groove etch and refill Akihisa Uchida, Daisuke Okada, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura 1988-05-24
4729965 Method of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by lithography Yoichi Tamaki, Kazuhiko Sagara, Norio Hasegawa, Shinji Okazaki, Hirotaka Nishizawa 1988-03-08
4700464 Method of forming trench isolation in an integrated circuit Daisuke Okada, Akihisa Uchida, Shinji Nakashima, Nobuhiko Ohno, Katsumi Ogiue 1987-10-20