LC

Lee Melbourne Cook

RH Rodel Holdings: 49 patents #1 of 95Top 2%
RH Rohm And Haas Electronic Materials Cmp Holdings: 10 patents #29 of 239Top 15%
GE Galileo Electro-Optics: 8 patents #2 of 38Top 6%
SC Schott Glass Technologies Co.: 3 patents #7 of 36Top 20%
NH Nitta Haas: 1 patents #22 of 56Top 40%
PO Polaroid: 1 patents #513 of 898Top 60%
UE US Dept of Energy: 1 patents #1,355 of 5,099Top 30%
📍 Atglen, PA: #1 of 13 inventorsTop 8%
🗺 Pennsylvania: #324 of 74,527 inventorsTop 1%
Overall (All Time): #28,718 of 4,157,543Top 1%
71
Patents All Time

Issued Patents All Time

Showing 26–50 of 71 patents

Patent #TitleCo-InventorsDate
6319370 Apparatus for photoelectrochemical polishing of silicon wafers Lizhong Sun, James Shen 2001-11-20
6293852 Polishing pads and methods relating thereto John Roberts, David B. James 2001-09-25
6287185 Polishing pads and methods relating thereto John V. H. Roberts, David B. James, Charles W. Jenkins 2001-09-11
6284114 Method of fabricating a porous polymeric material by electrophoretic deposition Nina G. Chechik, Richard M. Levering, Jr., David B. James 2001-09-04
6245679 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers David B. James, William D. Budinger, John V. H. Roberts, Michael R. Oliver, Nina G. Chechik +1 more 2001-06-12
6231434 Polishing pads and methods relating thereto David B. James, Charles W. Jenkins, Heinz Reinhardt, John V. H. Roberts, Raj Raghav Pillai 2001-05-15
6218305 Composition and method for polishing a composite of silica and silicon nitride Sharath Hosali, Anantha R. Sethuraman, Jiun-Fang Wang, Michael R. Oliver 2001-04-17
6217434 Polishing pads and methods relating thereto John Roberts, David B. James 2001-04-17
6210254 Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s) David B. James, Nina G. Chechik, William D. Budinger 2001-04-03
6210525 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers David B. James, William D. Budinger, John V. H. Roberts, Michael R. Oliver, Nina G. Chechik +1 more 2001-04-03
6132637 Composition and method for polishing a composite of silica and silicon nitride Sharath Hosali, Anantha R. Sethuraman, Jiun-Fang Wang, Michael R. Oliver 2000-10-17
6106754 Method of making polishing pads David B. James, Charles W. Jenkins, Heinz Reinhardt, John V. H. Roberts, Raj Raghav Pillai 2000-08-22
6093649 Polishing slurry compositions capable of providing multi-modal particle packing and methods relating thereto John V. H. Roberts, William D. Budinger 2000-07-25
6074546 Method for photoelectrochemical polishing of silicon wafers Lizhong Sun, James Shen 2000-06-13
6042741 Composition for polishing a composite of silica and silicon nitride Sharath Hosali, Anantha R. Sethuraman, Jiun-Fang Wang 2000-03-28
6036579 Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto David B. James, Nina G. Chechik, William D. Budinger 2000-03-14
6030899 Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers David B. James, William D. Budinger 2000-02-29
6022268 Polishing pads and methods relating thereto John V. H. Roberts, David B. James 2000-02-08
6022264 Polishing pad and methods relating thereto David B. James, William D. Budinger 2000-02-08
6019666 Mosaic polishing pads and methods relating thereto John V. H. Roberts, David B. James, Heinz Reinhardt 2000-02-01
6017265 Methods for using polishing pads David B. James, Charles W. Jenkins, Heinz Reinhardt, John V. H. Roberts, Raj Raghav Pillai 2000-01-25
6001269 Method for polishing a composite comprising an insulator, a metal, and titanium Anantha R. Sethuraman, Huey-Ming Wang, Guangwei Wu 1999-12-14
5932486 Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers David B. James, William D. Budinger 1999-08-03
5860848 Polishing silicon wafers with improved polishing slurries Scott B. Loncki, James Shen, Keith G. Pierce 1999-01-19
5769689 Compositions and methods for polishing silica, silicates, and silicon nitride David Cossaboon, Jiun-Fang Wang 1998-06-23