Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Interface engineering during MGO deposition for magnetic tunnel junctions

Interface engineering during MGO deposition for magnetic tunnel junctions

US Patent 9988715 · Granted Jun 5, 2018

Estimated economic value: $53,771,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pre-exposure photoresist curing to enhance EUV lithographic performance2025
Selective etch using a sacrificial mask2024
Methods for making hard masks useful in next-generation lithography2024
Predicting etch characteristics in thermal etching and atomic layer etching2022
Selective atomic layer etching2020
Atomic layer etching of metal oxide2019
Method for selectively sealing ultra low-k porous dielectric layer using flowabl2018
Treatment for flowable dielectric deposition on substrate surfaces2017
Dielectric repair for emerging memory devices2017
Flowable oxide film with tunable wet etch rate2016
CVD flowable gap fill2016
Low-K oxide deposition by hydrolysis and condensation2016