Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Deposition of metal films using beta-hydrogen free precursors

Deposition of metal films using beta-hydrogen free precursors

US Patent 9982345 · Granted May 29, 2018

Estimated economic value: $37,048,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dry etching with etch byproduct self-cleaning2025
Dry etching with etch byproduct self-cleaning2025
Methods and apparatus for selective etch stop capping and selective via open for2025
Enhanced etch selectivity using halides2025
Enhanced etch selectivity using halides2025
Dual pressure oxidation method for forming an oxide layer in a feature2025
Selective etch of a substrate2025
Gap-fill with aluminum-containing films2024
Amphotericin B derivatives with improved therapeutic index2024
Low temperature deposition of iridium containing films2024
Non-line-of-sight deposition of coating on internal components of assembled devi2024
Electronic device having an oxygen free platinum group metal film2024