Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for controlling exhaust flow in wafer processing module

Method for controlling exhaust flow in wafer processing module

US Patent 9892982 · Granted Feb 13, 2018

Estimated economic value: $3,124,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated surveillance radar system2025
Photoresist and method2025
In-situ deposition and densification treatment for metal-comprising resist layer2025
Image sensor having an improved structure for small pixel designs2025
Photoresist layer surface treatment, cap layer, and method of forming photoresis2025
Vertical gate field effect transistor2025
Method, apparatus, and system for deploying service2025
Gate structures for semiconductor devices2025
Apparatus and method for manufacturing metal gate structures2025
Fluid ejection device with break(s) in cover layer2025
Dual metal via for contact resistance reduction2025
Photoresist layer outgassing prevention2025