Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for manufacturing a protective layer against HF etching, semiconductor device provided with the protective layer and method for manufacturing the semiconductor device

Method for manufacturing a protective layer against HF etching, semiconductor device provided with the protective layer and method for manufacturing the semiconductor device

US Patent 9758373 · Granted Sep 12, 2017

Estimated economic value: $9,536,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for manufacturing a capacitive pressure sensor and capacitive pressure se2025
Non-contact dimensional measurement device with micrometric resolution2025
Adaptive block mapping2025
Data relocation operation techniques2025
Setting switching for single-level cells2024
Piezoelectric micromachined ultrasonic transducer2024
Adaptive block mapping2024
Data relocation operation techniques2024
Log data storage for flash memory2023
Fatal error logging in a memory device2023
Adaptive data relocation for improved data management for memory2023
Controlling NAND operation latency2023