Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for depositing dielectric films via physical vapor deposition processes

Methods for depositing dielectric films via physical vapor deposition processes

US Patent 9633839 · Granted Apr 25, 2017

Estimated economic value: $22,808,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wireless charging apparatus and terminal using same2025
Power protection apparatus and terminal using the apparatus2025
Plasma processing apparatus2025
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Methods for forming structures with desired crystallinity for MRAM applications2025
Magnetic tunnel junctions with tunable high perpendicular magnetic anisotropy2025
Metal oxide preclean for bottom-up gapfill in MEOL and BEOL2025
One chamber multi-station selective metal removal2025
Methods for controlling contact resistance in cobalt-titanium structures2025
Shutter disk for physical vapor deposition (PVD) chamber2025
Workpiece processing apparatus with outer gas channel insert2025
Pulsing plasma treatment for film densification2025