Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pitch scalable active area patterning structure and process for multi-channel finFET technologies

Pitch scalable active area patterning structure and process for multi-channel finFET technologies

US Patent 9589958 · Granted Mar 7, 2017

Estimated economic value: $2,625,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Stacked vertical transport field effect transistor with anchors2025
Double patterned microcooler having alternating fin widths2025
Patterning magnetic tunnel junctions and the like while reducing detrimental res2025
Buried power rail at tight cell-to-cell space2025
Circuit interconnect structure2025
Structure containing a via-to-buried power rail contact structure or a via-to-ba2025
Structure containing a via-to-buried power rail contact structure or a via-to-ba2025
Stressed material within gate cut region2025
Air gap spacer for metal gates2025
Air gap spacer for metal gates2025
Integrated circuit having vertical routing to bond pads2025
Semiconductor backside transistor integration with backside power delivery netwo2025