Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma cleaning apparatus and method

Plasma cleaning apparatus and method

US Patent 9552968 · Granted Jan 24, 2017

Estimated economic value: $20,961,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Methods for depositing fluorine/carbon-free conformal tungsten2024
Multi-step pre-clean for selective metal gap fill2023
Apparatuses and methods of protecting nickel and nickel containing components wi2023
Substrate processing chamber having heated showerhead assembly2023
Method for forming a hydrophobic and icephobic coating2022
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2022
Multi-step pre-clean for selective metal gap fill2022
Method for forming a metal gapfill2022
Method for forming a metal gapfill2022
Process shield for a substrate processing chamber2022
Deposition ring for a substrate processing chamber2021