Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fluorocarbon molecules for high aspect ratio oxide etch

Fluorocarbon molecules for high aspect ratio oxide etch

US Patent 9514959 · Granted Dec 6, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Devices having a rare earth (oxy) fluoride coating for improved resistance to co2025
Processes for forming metal oxide thin films on electrode interphase control2025
Indium compound and method for forming indium-containing film using said indium 2025
Fail tolerant pad sensor circuit2025
Lithium precursors for deposition of lithium-containing layers, islets or cluste2025
Updating machine learning models2025
Discovery of source range partitioning information in data extract job2025
System for automatically augmenting a message based on context extracted from th2025
Compound and method for producing lithium-containing film2025
Adaptive change management framework (ACMF) systems, apparatuses, and computer-i2025
Etching methods with alternating non-plasma and plasma etching processes2025
Automating provisioning of configuration templates2025