Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for quantifying particle performance in a substrate processing system

Systems and methods for quantifying particle performance in a substrate processing system

US Patent 9335248 · Granted May 10, 2016

Estimated economic value: $6,609,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Autoclean for load locks in substrate processing systems2024
Halogen removal module and associated systems and methods2021
Symmetric RF return path liner2018
Plasma confinement ring assembly for plasma processing chambers2015
Method of making a gas distribution member for a plasma processing chamber2014
Edge ring assembly for plasma etching chambers2014
High lifetime consumable silicon nitride-silicon dioxide plasma processing compo2014
System and method for in situ characterization and maintenance of polishing pad 2006
Assembly and method for generating a hydrodynamic air bearing2006
Apparatus and associated method for conditioning in chemical mechanical planariz2006
Apparatus for edge polishing uniformity control2006
300 mm platen and belt configuration2005