Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › EDA tool and method for conflict detection during multi-patterning lithography

EDA tool and method for conflict detection during multi-patterning lithography

US Patent 9141752 · Granted Sep 22, 2015

Estimated economic value: $2,437,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated circuit, system for and method of forming an integrated circuit2025
Standard cell design with dummy padding2025
Timing driven cell swapping2025
Integrated circuit and method of manufacturing the same2025
Standard cell and semiconductor device including anchor nodes2025
Standard-cell layout structure with horn power and smart metal cut2025
Engaging mechanism2025
Sneaker2024
Semiconductor device2024
Sandal2024
Block level design method for heterogeneous PG-structure cells2024
Semiconductor device and layout thereof2024