Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for chemical vapor deposition control

Method for chemical vapor deposition control

US Patent 9139910 · Granted Sep 22, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for etching a substrate using a hybrid wet atomic layer etching process2025
Methods for stabilization of self-assembled monolayers (SAMs) using sequentially2025
Etching method and etching apparatus2025
Systems for etching a substrate using a hybrid wet atomic layer etching process2025
Selective etching with fluorine, oxygen and noble gas containing plasmas2024
Processing systems and platforms for roughness reduction of materials using illu2024
Dynamically adjusted purge timing in wet atomic layer etching2024
Methods for wet atomic layer etching of copper2024
Inventory management and delivery through image and data integration2023
Dry non-plasma treatment system2023
Inventory management through image and data integration2023
Methods for area-selective deposition of polymer films using sequentially pulsed2023