Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for depositing layers having reduced interfacial contamination

Methods for depositing layers having reduced interfacial contamination

US Patent 9058988 · Granted Jun 16, 2015

Estimated economic value: $20,291,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate processing apparatus2025
Methods of correlating zones of processing chambers, and related systems and met2025
Multizone lamp control and individual lamp control in a lamphead2025
Methods for detection using optical emission spectroscopy2025
Semiconductor device including barrier layer between active region and semicondu2025
Method for forming silicon-phosphorous materials2025
Temperature profile measurement and synchronized control on substrate and suscep2025
Methods and systems for cleaning high aspect ratio structures2024
Multi zone spot heating in EPI2024
Semiconductor device2024
Method for epitaxially depositing a material on a substrate by flowing a process2024
Gas injector for epitaxy and CVD chamber2024