Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof

Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof

US Patent 9058976 · Granted Jun 16, 2015

Estimated economic value: $2,098,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Formation of trench silicide source or drain contacts without gate damage2025
Transistor comprising an air gap positioned adjacent a gate electrode2022
Formation of trench silicide source or drain contacts without gate damage2022
III-V lateral bipolar junction transistor on local facetted buried oxide layer2022
III-V lateral bipolar junction transistor on local facetted buried oxide layer2022
Methods, apparatus and system for a self-aligned gate cut on a semiconductor dev2021
Gate cut structures2021
SOI wafers with buried dielectric layers to prevent CU diffusion2021
Vertical resistor adjacent inactive gate over trench isolation2021
Insulating gate separation structure for transistor devices2020
IC structure with metal cap on cobalt layer and methods of forming same2020
Stacked indium gallium arsenide nanosheets on silicon with bottom trapezoid isol2020