Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatus

Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatus

US Patent 9046385 · Granted Jun 2, 2015

Estimated economic value: $18,108,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for controlling a lithographic process2025
Methods and apparatus for obtaining diagnostic information relating to an indust2025
Target for measuring a parameter of a lithographic process2025
Alignment method and associated alignment and lithographic apparatuses2024
Measurement apparatus and a method for determining a substrate grid2024
Methods and apparatus for obtaining diagnostic information relating to an indust2024
Alignment method and associated alignment and lithographic apparatuses2024
Measurement apparatus2024
Phase modulators in alignment to decrease mark size2023
Methods of determining corrections for a patterning process, device manufacturin2023
Method for determining corrections for lithographic apparatus2023
Methods of determining corrections for a patterning process, device manufacturin2023