Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuator

Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuator

US Patent 9041910 · Granted May 26, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and device for determining the heating state of an optical element in an 2022
Method for determining properties of an EUV source2021
Device for swiveling a mirror element with two degrees of swiveling freedom2020
EUV exposure apparatus with reflective elements having reduced influence of temp2020
Sensor device2019
Device for transmitting electrical signals, and lithography apparatus2019
Method for illuminating an object field of a projection exposure system2019
EUV exposure apparatus with reflective elements having reduced influence of temp2019
Arrangement for actuating at least one optical element in an optical system2019
Projection exposure apparatus including mechanism to reduce influence of pressur2018
Arrangement for manipulating the position of an element2018
Mirror device2018