Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same

Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same

US Patent 9029067 · Granted May 12, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wall panel2025
Method and composition for selectively modifying base material surface2023
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2023
Composition for film formation, film-forming method and directed self-assembly l2022
Composition for pattern formation, and pattern-forming method2022
Pattern-forming method, and composition2022
Method and composition for selectively modifying base material surface2021
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2021
Composition for film formation, film, resist underlayer film-forming method, pro2021
Method and composition for selectively modifying base material surface2021
Pattern-forming method and composition2020
Fluorine-containing polymer, purification method, and radiation-sensitive resin 2020