Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Film adhesive for semiconductor vacuum processing apparatus

Film adhesive for semiconductor vacuum processing apparatus

US Patent 9028646 · Granted May 12, 2015

Estimated economic value: $13,244,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Variable depth edge ring for etch uniformity control2022
Variable depth edge ring for etch uniformity control2020
Showerhead electrode assemblies for plasma processing apparatuses2018
Coating system and method for coating interior fluid wetted surfaces of a compon2018
Cooled pin lifter paddle for semiconductor substrate processing apparatus2018
Dense oxide coated component of a plasma processing chamber and method of manufa2017
Processing chamber with features from side wall2016
Methods for verifying gas flow rates from a gas supply system into a plasma proc2016
Method of polishing a metal surface of a barrier door of a gate valve used in a 2015
Dense oxide coated component of a plasma processing chamber and method of manufa2015
Multiple zone climate control system2015
Pressure controlled heat pipe temperature control plate2015