Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Evaluation of etching conditions for pattern-forming film

Evaluation of etching conditions for pattern-forming film

US Patent 8992788 · Granted Mar 31, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device2025
Control apparatus and control method2025
Reflective mask blank, and method for manufacturing reflective mask2025
Reflective mask blank, and method for manufacturing reflective mask2025
Reflective mask blank and reflective mask2024
Reflective mask blank, method of manufacturing thereof, and reflective mask2024
Substrate with multilayer reflection film for EUV mask blank, manufacturing meth2024
Substrate with multilayer reflection film for EUV mask blank, manufacturing meth2024
Substrate with multilayer reflection film for EUV mask blank, manufacturing meth2023
Substrate with multilayer reflection film for EUV mask blank, manufacturing meth2023
Method of manufacturing reflective mask blank, and reflective mask blank2023
Photomask blank, and manufacturing method thereof2023