Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process monitoring device and process monitoring method in semiconductor manufacturing apparatus and semiconductor manufacturing apparatus

Process monitoring device and process monitoring method in semiconductor manufacturing apparatus and semiconductor manufacturing apparatus

US Patent 8989477 · Granted Mar 24, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Abnormality detection apparatus and abnormality detection method2025
Substrate inspection device, substrate inspection system, and substrate inspecti2025
Substrate processing monitoring apparatus based on imaging video data, substrate2025
State determination device, state determination method, and computer-readable re2024
Abnormality detection apparatus and abnormality detection method2024
Substrate defect inspection apparatus, substrate defect inspection method, and s2023
Substrate state determining apparatus, substrate processing apparatus, model gen2023
Film thickness measuring system and film thickness measuring method2022
Film thickness measurement device and correction method2022
Substrate defect inspection apparatus, substrate defect inspection method, and s2022
Substrate defect inspection apparatus, substrate defect inspection method, and s2020
Substrate processing apparatus, monitoring device of substrate processing appara2018