Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › DEMOS formed with a through gate implant

DEMOS formed with a through gate implant

US Patent 8933510 · Granted Jan 13, 2015

Estimated economic value: $22,709,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lead frame device with shared terminal2025
Stackable and embeddable vertical capacitors in semiconductor devices and method2025
Lead frame and method for stacking discrete components to be embedded in semicon2024
Gallium nitride transistor with a doped region2024
ESD protection circuit with isolated SCR for negative voltage operation2024
Gallium nitride transistor with a doped region2023
ESD protection circuit with isolated SCR for negative voltage operation2022
HEMT wafer probe current collapse screening2021
ESD protection circuit with isolated SCR for negative voltage operation2021
Gallium nitride transistor with a doped region2021
Transistor with multiple GaN-based alloy layers2020
High voltage CMOS with triple gate oxide2020