Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Vapor deposition methods of SiCOH low-k films

Vapor deposition methods of SiCOH low-k films

US Patent 8932674 · Granted Jan 13, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Devices having a rare earth (oxy) fluoride coating for improved resistance to co2025
Processes for forming metal oxide thin films on electrode interphase control2025
Indium compound and method for forming indium-containing film using said indium 2025
Lithium precursors for deposition of lithium-containing layers, islets or cluste2025
Compound and method for producing lithium-containing film2025
Lanthanoid compound, lanthanoid-containing thin film and formation of lanthanoid2024
Heteroalkylcyclopentadienyl indium-containing precursors and processes of using 2024
Group 6 transition metal-containing compounds for vapor deposition of group 6 tr2023
Furnace with integrated heat recovery utilizing radiative recuperator for prehea2022
Group 6 transition metal-containing compounds for vapor deposition of group 6 tr2021
Fluorocarbon molecules for high aspect ratio oxide etch2021
Fluorocarbon molecules for high aspect ratio oxide etch2021